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Home > About JPO > Pickup News > Photo Gallery > Third Industrial Design 5 Forum (ID5) Annual Meeting Held - International cooperation advancing to develop a global-level environment for protecting designs -

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Third Industrial Design 5 Forum (ID5) Annual Meeting Held
- International cooperation advancing to develop a global-level environment for protecting designs -

December 6, 2017

On December 4 and 5, 2017, the Industrial Design Forum 5 (ID5), consisting of the Japan Patent Office (JPO), the United States Patent and Trademark Office (USPTO), the European Union Intellectual Property Office (EUIPO), the State Intellectual Property Office of the People’s Republic of China (SIPO), and the Korean Intellectual Property Office (KIPO), and aiming at the enhancement of international cooperation for design protection in the design field between those five offices, held the third Annual Meeting in Alicante, Spain. Mr. Sawai, Director-General, Patent and Design Examination Department, participated in the meeting as a representative of JPO.

(photo)Mr. Sawai, Director-General, Patent and Design Examination Department of the JPO (the left end) with representatives from other ID5 Offices
Mr. Sawai, Director-General, Patent and Design Examination Department of the JPO (the left end) with representatives from other ID5 Offices

At the meeting, the ID5 compiled the results of comparative research concerning design systems of the five offices into reports, focused on the requirements for protection of designs, i.e., the scope of a created design eligible to be protected, requirements for disclosure of the view and drawing for design applications, practices of foreign priority right, design classification systems for retrieving designs, and statistic data on design applications and examinations. These achievements will contribute to discussions toward the future international harmonization in design systems and operations. Also, the ID5 agreed on the future release of the compiled reports to users and the establishment of an official ID5 website as a platform to share information on ID5 cooperative activities with users as below. (official ID5 website ( External link ))

Moreover, the ID5 confirmed that the five offices will continue to advance the researches concerning protection of new technological designs, i.e., new designs derived from digital technologies e.g., GUI and systems and practices on partial designs and grace periods. On the second day of the meeting, the ID5 held an ID5 user session to provide users of design systems of the five offices with an opportunity to participate in the session and directly exchange views with the offices. Responsible officials from the offices and users proactively exchanged views under the theme of protection of new technological designs.

At the meeting, the JPO made an announcement of its participation in “DesignView,” a one-stop access point to retrieve registered design information held by 54 participating IP offices worldwide. This participation will allow users in Japan to retrieve information in Japanese on over 13 million designs registered in many countries*. Moreover, this tool will also allow users worldwide to retrieve information on registered designs in Japan in 36 languages, including Japanese.
(DesignView ( External link ))
*Note: The figure for the accumulated number of retrievable registered designs shows that as of December 2017.

Mr. Sawai stated hopes for early accession of China* to the Hague Agreement(international registration system of designs) in his speech and as well as expressed the JPO’s readiness to cooperate with SIPO actively as a Partner of ID5.
*Note: China is the only country which has not acceded to the Hague Agreement among the countries/intergovernmental organization of ID5.

[Last updated 11 December 2017]