Chapter 2 第2章803) IP5 MeetingThe IP5 is a forum established in 2007 by the ve IP oices of Japan, the U.S., Europe, China, and South Korea. The IP5 oices cooperate broadly on issues such as harmonization of practices and procedures in the eld of patents, mutual utilization of examination results, enhancing the quality of patent examinations, and improving patent information services.(i) The 11th IP5 Heads Meeting (June 2018, the U.S.)• The IP5 oices evaluated the progress and achievements of all IP5 projects undertaken to date, and claried which projects will be focused on in the future.• Working towards promoting the utilization of examination-related information (dossier information) by users, the IP5 oices agreed on the new direction of the ve priority areas of the “Global Dossier” (a concept in which the IP5 oices will have their IT systems collaborate to share dossier information with general users, etc.) for the next couple of years, and nalized scope document of each project.• The IP5 oices agreed to initiate PCT Collaborative Search and Examination Pilot Projects from July 1, 2018.• In addition, at the IP5 Heads of Oice with IP5 Industry Meeting held on the day before the 11th IP5 Heads Meeting, the Heads and the Industry discussed various issues including “Quality” and “Evolution of the IP5”.[Picture 6]4) ID5 MeetingThe ID5 is a framework established in 2015 to promote international cooperation in the eld of industrial designs among ve IP oices, responsible for industrial designs, of Japan, the U.S., Europe, China, and South Korea, who collectively handle over 80% of the world’s applications for design registration.(i) The 4th ID5 Annual Meeting (November 2018, South Korea)• With the rapid progress of the fourth industrial revolution, the ID5 adopted the “ID5 Joint Statement”, which represents the shared views of the ve oices in strengthening protection for new technological designs such as Graphical User Interface (GUI) designs, which are derived from progressing digital technologies.• Of the existing cooperation projects, the ID5 approved the reports compiling the following comparative study results; current practices of protection for new technological designs, eligibility for design protection (protectable subject matter, entitlement as creator/applicant), partial designs, and grace periods. These reports will be published on the ID5 website＊3.• The ID5 also adopted six new cooperation projects, namely, 3D printing and design protection, design data resources (design non-patent literature), quality management, admissibility of Internet information as legitimate disclosure for novelty examinations, remedies and relief for industrial design infringement, and ID5 recommended design practices.• At the ID5 user session, outlines of the comparative study results and the new cooperation projects both approved at the plenary session were shared to the user group participants from the ve regions, and such issues as protection of new technological designs and the need for international harmonization of design systems were discussed.• The 2019 ID5 Meeting will be held in Japan, with the JPO serving as the secretariat. [Picture 7]＊3http://id-ve.orgFrom left to right: Commissioner Shen (CNIPA), Commissioner Sung (KIPO), Director Iancu (USPTO), President Battistelli (EPO), Commissioner Munakata (JPO), Deputy Director General Sandage (WIPO)左から、申CNIPA 局長、ソンKIPO庁長、イアンクUSPTO長官、バティステリEPO長官、宗像長官、サンデージWIPO事務局次長Picture 6 写真6
元のページ ../index.html#80