H05H   1/00  \	0	0	2G084	H05H   1/00	83	ץ饺ޤץ饺ޤμ谷ǮͻϧؤΥץ饺޵Ѥαѣǣ£	Generating plasma; Handling plasma (application of plasma technique in thermonuclear fusion reactors G21B 1/00)
H05H   1/00  A	0	0	2G084	H05H   1/00	1378	ץ饺޿ǡ¬˴ؤ	related to plasma diagnostics or measurement
H05H   1/00  Z	0	0	2G084	H05H   1/00	100	¾Τ	Others
H05H   1/02  \	1	1	2G084	H05H   1/02	75	ųޤϼ뤤Ϥˤäƥץ饺ޤĤ뤿֡ץ饺ޤǮ뤿֡ŻҸأȣʡ	Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma (electron optics H01J)
H05H   1/03  \	2	2	2G084	H05H   1/03	11	ųѤΡΣ	using electrostatic fields [3]
H05H   1/04  \	2	2	2G084	H05H   1/04	21	ץ饺Ťˤäȯ뼧Ѥ	using magnetic fields substantially generated by the discharge in the plasma
H05H   1/06  \	3	3	2G084	H05H   1/06	46	ľԥץ饺ȯ	Longitudinal pinch devices
H05H   1/08  \	3	3	2G084	H05H   1/08	14	ͶƳԥʦȥԥ˥ץ饺ȯ	Theta pinch devices
H05H   1/10  \	2	2	2G084	H05H   1/10	67	ΤߤѤ	using applied magnetic fields only
H05H   1/11  \	3	3	2G084	H05H   1/11	46	۰̤ѤΡʣȣȣͥˡΣ	using cusp configuration (H05H 1/14 takes precedence) [3]
H05H   1/12  \	3	3	2G084	H05H   1/12	164	ĥ롼׷ƴѤΡ㡥ƥ쥤	wherein the containment vessel forms a closed loop, e.g. stellarator
H05H   1/14  \	3	3	2G084	H05H   1/14	53	ƴ郎ľǼĤ	wherein the containment vessel is straight and has magnetic mirrors
H05H   1/16  \	2	2	2G084	H05H   1/16	100	ųȼѤ	using applied electric and magnetic fields
H05H   1/18  \	3	3	2G084	H05H   1/18	268	Ķȡ㡥ޥΰ衤οưųӼѤ	wherein the fields oscillate at a very high frequency, e.g. in the microwave range
H05H   1/20  \	2	2	2G084	H05H   1/20	15	Ǯ	Ohmic heating
H05H   1/22  \	2	2	2G084	H05H   1/22	486	ͲǮΤΤ	for injection heating
H05H   1/24  \	1	1	2G084	H05H   1/24	5016	ץ饺ޤȯΣ	Generating plasma [2]
H05H   1/26  \	2	2	2G084	H05H   1/26	524	ץ饺ޥȡΣ	Plasma torches [2]
H05H   1/28  \	3	3	2G084	H05H   1/28	247	֡Σ	Cooling arrangements [3]
H05H   1/30  \	3	3	2G084	H05H   1/30	598	żѤΡ㡥Ȥޤϥޥȥͥ륮ʣȣȣͥˡΣ	using applied electromagnetic fields, e.g. high-frequency or microwave energy (H05H 1/28 takes precedence) [3]
H05H   1/32  \	3	3	2G084	H05H   1/32	459	ѤΡʣȣȣͥˡΣ	using an arc (H05H 1/28 takes precedence) [3]
H05H   1/34  \	4	4	2G084	H05H   1/34	852	㡥ŶˡΥΣ	Details, e.g. electrodes, nozzles [3]
H05H   1/36  \	5	5	2G084	H05H   1/36	162	ϩ֡ʣȣȣȣȣͥˡΣ	Circuit arrangements (H05H 1/38, H05H 1/40 take precedence) [3]
H05H   1/38  \	5	5	2G084	H05H   1/38	48	Ŷˤΰޤϥ󥿥󥰡Σ	Guiding or centering of electrodes [3]
H05H   1/40  \	5	5	2G084	H05H   1/40	103	ѤΡ㡥«ޤϲž뤿ΤΡΣ	using applied magnetic fields, e.g. for focusing or rotating the arc [3]
H05H   1/42  \	4	4	2G084	H05H   1/42	450	ץ饺˺㡥ʴޤϱΡƳ뤿ͭΡΣ	with provisions for introducing materials into the plasma, e.g. powder or liquid
H05H   1/44  \	4	4	2G084	H05H   1/44	80	ʣΥȡѤΡΣ	using more than one torch [3]
H05H   1/46  \	2	2	2G084	H05H   1/46	428	żѤΡ㡥Ȥޤϥޥȥͥ륮ʣȣȣͥˡΣ	using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/26 takes precedence) [3]
H05H   1/46  A	2	0	2G084	H05H   1/46	2468	ץ饺޽	Plasma treatment device
H05H   1/46  B	2	1	2G084	H05H   1/46	2558	ޥȥץ饺	Microwave plasma
H05H   1/46  C	2	2	2G084	H05H   1/46	1109	ȥġʣţãҡɣãҡˤѤ	utilising cyclotron resonance (ECR, ICR)
H05H   1/46  L	2	1	2G084	H05H   1/46	3251	ͶƳץ饺	Inductively Coupled Plasma
H05H   1/46  M	2	1	2G084	H05H   1/46	4451	̷ץ饺	Capacitively Coupled. Plasma
H05H   1/46  R	2	0	2G084	H05H   1/46	2346	ŵϩ	Electrical circuit
H05H   1/46  Z	2	0	2G084	H05H   1/46	83	¾Τ	Others
H05H   1/48  \	2	2	2G084	H05H   1/48	367	ѤΡʣȣȣͥˡΣ	using an arc (H05H 1/26 takes precedence) [3]
H05H   1/50  \	3	3	2G084	H05H   1/50	82	ƼѤΡ㡥«ޤϲž뤿ΤΡΣ	and using applied magnetic fields, e.g. for focusing or rotating the arc [3]
H05H   1/52  \	2	2	2G084	H05H   1/52	26	ץǥ󥰥磻ޤϥѡåפѤΡʣȣȣͥˡΣ	using exploding wires or spark gaps (H05H 1/26 takes precedence)
H05H   1/54  \	1	1	2G084	H05H   1/54	250	ץ饺ޤβ®Σ	Plasma accelerators [3]
H05H   3/00  \	0	0	2G085	H05H   3/00	99	γҥӡࡤ㡥ʬҤޤϸҥӡȯޤϲ®Σ	Production or acceleration of neutral particle beams, e.g. molecular or atomic beams [3]
H05H   3/02  \	1	1	2G085	H05H   3/02	255	ʬҥӡޤϸҥӡȯ㡥ӡȯΣ	Molecular or atomic-beam generation, e.g. resonant beam generation
H05H   3/04  \	1	1	2G085	H05H   3/04	2	żȰϤˤ®Σ	Acceleration by electromagnetic wave pressure [3]
H05H   3/06  \	1	1	2G085	H05H   3/06	295	ҥӡȯΡʳȿ򵯤ΥåȣȣȣҸǣǣˡΣ	Generating neutron beams (targets for producing nuclear reactions H05H 6/00; neutron sources G21G 4/02) [5]
H05H   5/00  \	0	0	2G085	H05H   5/00	226	ľήŰ®ñѥ륹Ѥ®ʣȣȣͥˡΣ	Direct voltage accelerators; Accelerators using single pulses (H05H 3/06 takes precedence) [5]
H05H   5/02  \	1	1	2G085	H05H   5/02	7	ʳȿ򵯤ΥåȣȣȣˡΣ	Details (targets for producing nuclear reactions H05H 6/00) [3]
H05H   5/02  A	1	0	2G085	H05H   5/02	299	Ÿ	Power supply device
H05H   5/02  B	1	0	2G085	H05H   5/02	225	°	Auxiliary device
H05H   5/02  C	1	0	2G085	H05H   5/02	105	ӡݥή	Beam current control
H05H   5/02  Z	1	0	2G085	H05H   5/02	41	¾Τ	Others
H05H   5/03  \	2	2	2G085	H05H   5/03	162	®ɡΣ	Accelerating tubes
H05H   5/04  \	1	1	2G085	H05H   5/04	23	ȯŵˤꡤ㡥Хǥȯŵˤꡤ®ΡΣ	energised by electrostatic generators, e.g. by van de Graaff generator [4]
H05H   5/06  \	1	1	2G085	H05H   5/06	118	ǥ෿®¿ʷ®	Tandem accelerators; Multi-stage accelerators
H05H   5/08  \	1	1	2G085	H05H   5/08	11	ȥ󥹡㡥ȥ󥹡ѤγҲ®Σ	Particle accelerators using step-up transformers, e.g. resonance transformers [4]
H05H   6/00  \	0	0	2G085	H05H   6/00	317	ȿ򵯤Υåȡʾȼͤ륿åȤޤʪΤλٻǣˣˡΣ	Targets for producing nuclear reactions (supports for targets or objects to be irradiated G21K 5/08) [3]
H05H   7/00  \	0	0	2G085	H05H   7/00	768	롼ףȣȣȣȣˤäޤ뷿֤κʳȿ򵯤ΥåȣȣȣˡΣ	Details of devices of the types covered by groups H05H 9/00-H05H 13/00 (targets for producing nuclear reactions H05H 6/00) [3]
H05H   7/02  \	1	1	2G085	H05H   7/02	192	ȥͥ륮򶡵뤹뤿βϩΣ	Circuits or systems for supplying or feeding radio-frequency energy
H05H   7/04  \	1	1	2G085	H05H   7/04	961	֤֡弧	Magnet systems; Energisation thereof
H05H   7/06  \	1	1	2G085	H05H   7/06	8	ӡ֡¿ӡ	Two-beam arrangements; Multi-beam arrangements
H05H   7/08  \	1	1	2G085	H05H   7/08	757	γҤƻͤ뤿	Arrangements for injecting particles into orbits
H05H   7/10  \	1	1	2G085	H05H   7/10	196	γҤƻФ뤿	Arrangements for ejecting particles from orbits
H05H   7/12  \	1	1	2G085	H05H   7/12	38	ӡκǽͥ륮ѹ	Arrangements for varying final energy of beam
H05H   7/14  \	1	1	2G085	H05H   7/14	338	ʣȣȣͥˡΣ	Vacuum chambers (H05H 5/03 takes precedence) [4]
H05H   7/16  \	2	2	2G085	H05H   7/16	22	ƳȴɷΤΡΣ	of the waveguide type [4]
H05H   7/18  \	2	2	2G085	H05H   7/18	307	ƹΣ	Cavities; Resonators [4]
H05H   7/20  \	3	3	2G085	H05H   7/20	160	ĶƳɤͭΡΣ	with superconductive walls [4]
H05H   7/22  \	1	1	2G085	H05H   7/22	50	®κ㡥ɥեȴɡʣȣȣȣȣͥˡΣ	Details of linear accelerators, e.g. drift tubes (H05H 7/02-H05H 7/20 take precedence) [4]
H05H   9/00  \	0	0	2G085	H05H   9/00	4	®ʣȣȣͥ	Linear accelerators (H05H 11/00 takes precedence)
H05H   9/00  A	0	0	2G085	H05H   9/00	310	®	Linear accelerators in general
H05H   9/00  B	0	0	2G085	H05H   9/00	351	®¤	Structure of the accelerator
H05H   9/00  C	0	0	2G085	H05H   9/00	180	١ͥ륮	Strength or energy control
H05H   9/00  D	0	0	2G085	H05H   9/00	110	ȿ	Frequency control
H05H   9/00  E	0	0	2G085	H05H   9/00	80		Cooling
H05H   9/00  F	0	0	2G085	H05H   9/00	179		Details
H05H   9/00  Z	0	0	2G085	H05H   9/00	42	¾	Others
H05H   9/02  \	1	1	2G085	H05H   9/02	14	ʹȷ®	Travelling-wave linear accelerators
H05H   9/04  \	1	1	2G085	H05H   9/04	68	ȷ®	Standing-wave linear accelerators
H05H  11/00  \	0	0	2G085	H05H  11/00	216	ͶƳ®㡥١ȥ	Magnetic induction accelerators, e.g. betatrons
H05H  11/02  \	1	1	2G085	H05H  11/02	0	١ȥ	Air-cored betatrons
H05H  11/04  \	1	1	2G085	H05H  11/04	1	᷿١ȥ	Biased betatrons
H05H  13/00  \	0	0	2G085	H05H  13/00	489	®ȥ	Magnetic resonance accelerators; Cyclotrons
H05H  13/02  \	1	1	2G085	H05H  13/02	135	󥯥ȥ㡥ƣͥȥ	Synchrocyclotrons, i.e. frequency-modulated cyclotrons
H05H  13/04  \	1	1	2G085	H05H  13/04	153	󥯥ȥ	Synchrotrons
H05H  13/04  B	1	0	2G085	H05H  13/04	43	®֡˳ιħͭ	Characterized by the configuration of each part of the accelerator (accumulator)
H05H  13/04  C	1	1	2G085	H05H  13/04	244	ƶƴΤιʥݥסӵϡ	Configuration for the cavity, vacuum container, or vacuum (pump or exhaust system)
H05H  13/04  D	1	2	2G085	H05H  13/04	163	ȶƶ	High-frequency cavity
H05H  13/04  E	1	1	2G085	H05H  13/04	302		Magnet device
H05H  13/04  F	1	2	2G085	H05H  13/04	282	顢󥸥ݥ	Wiggler, undulator
H05H  13/04  G	1	1	2G085	H05H  13/04	316	м͡ʹмʹ	Incoming/outgoing, incoming device, outgoing device
H05H  13/04  H	1	1	2G085	H05H  13/04	56		Cooling
H05H  13/04  M	1	0	2G085	H05H  13/04	148	桢¬ħͭ	characterized by control, instrumentation, or measurement
H05H  13/04  N	1	1	2G085	H05H  13/04	266	žˡ弧ˡ	Operating method, exciting method
H05H  13/04  P	1	1	2G085	H05H  13/04	63	ȿƱĴݥʡΨ	Frequency tuning, tuner, coupling rate
H05H  13/04  Q	1	1	2G085	H05H  13/04	137	ƻʰ경Ѱ̡ưư	Track (stabilisation, displacement, wave motion)
H05H  13/04  R	1	1	2G085	H05H  13/04	162	¬ʡ¬ˡ	Measuring means, measuring method
H05H  13/04  S	1	0	2G085	H05H  13/04	90	ƹǤ֡ʣβ®Ȥ߹碌	Layout of each component, combination of multiple accelerators
H05H  13/04  U	1	0	2G085	H05H  13/04	383	͸μ谷ϪΤιʥߥݡ֥ݥС	Handling of radiation light, configuration for exposure (mirror, absorber)
H05H  13/04  Z	1	0	2G085	H05H  13/04	540	¾Τ	Others
H05H  13/06  \	1	1	2G085	H05H  13/06	2	®	Air-cored magnetic resonance accelerators
H05H  13/08  \	1	1	2G085	H05H  13/08	3	Ǽ®	Alternating-gradient magnetic resonance accelerators
H05H  13/10  \	1	1	2G085	H05H  13/10	69	γҤǽβ®ʿԤʵƻ᤹ΣĤޤʣ®ѶʼФޤΤΤ®㡥ޥȥΣ	Accelerators comprising one or more linear accelerating sections and bending magnets or the like to return the charged particles in a trajectory parallel to the first accelerating section, e.g. microtrons [4]
H05H  15/00  \	0	0	2G085	H05H  15/00	115	γҤ¾ʬवʤ®ˡޤ֡Σ	Methods or devices for acceleration of charged particles not otherwise provided for [4]
