G03F   1/00		եȥᥫ˥ˡˤ̲ϥѥ󲽤줿ɽ̤¤Ѥ븶ơ㡥ޥեȥޥϥ롨ΤΥޥ֥ϥڥꥯ롨äˤŬ礷ƴνΣ<br><br><b><ul></ul></b><br>Υᥤ󥰥롼פǤϡեȥץ쥤ͥ롼뤬ŬѤ롤ʤƳإ٥ˤơȿؼʤ¤ꡤǽŬڤʲսʬह롣Σ	Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof; <br><br><b><u>Note(s)</u></b><br><br><ul><li>In this main group, the first place priority rule is applied, i.e. at each hierarchical level, in the absence of an indication to the contrary, classification is made in the first appropriate place.   </li></ul>	15331
G03F   1/20		γΣãУ¡Ϥ͡㡥ŻˤäƲ뤿Υޥϥޥ֥󥯡νΣ	Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof	1565
G03F   1/22		ʲĹͤˤäƲ뤿Υޥϥޥ֥󥯡㡥ޥü糰Σţգ֡ϥޥνΣ	Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof	3308
G03F   1/24		ȿͥޥνΣ	Reflection masks; Preparation thereof	2155
G03F   1/26		ꥷեȥޥΣУӣ͡ϡУӣ֥ͥ󥯡νΣ	Phase shift masks [PSM]; PSM blanks; Preparation thereof	1620
G03F   1/28		ƱΣУӣ;ˣʾΰꡨνΣ	with three or more diverse phases on the same PSM; Preparation thereof	196
G03F   1/29		УӣϥȥꥬУӣ͡νΣ	Rim PSM or outrigger PSM; Preparation thereof	569
G03F   1/30		ߣУӣ͡㡥ë٥󥽥Уӣ͡νΣ	Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof	1077
G03F   1/32		Уӣ͡ΣݣУӣ͡ϡ㡥ϡեȡУӣȾƩʰꥷեͭУӣ͡νΣ	Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof	2184
G03F   1/34		եåУӣ͡㡥쥹Уӣ͡νΣ	Phase-edge PSM, e.g. chromeless PSM; Preparation thereof	299
G03F   1/36		ܸħͭޥν㡥ܸΣϣУáϥǥץΣ	Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes	3665
G03F   1/38		Ūħͭޥ㡥̤ʥƥϥ饤ȼ㤷ϻΤΥޡνΣ	Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof	2246
G03F   1/40		šΣţӣġϤ˴Ϣħ㡥ɻߥƥϥޥĤμϤƳ°ءΣ	Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate	570
G03F   1/42		饤ϽŤ͹碌ʥ쥸ȥ졼ˤħ㡥ޥľΥ饤ȥޡΣ	Alignment or registration features, e.g. alignment marks on the mask substrates	1368
G03F   1/44		¬ħ㡥ʻҥѥ󡤥ե˥ΤϥΥåΣ	Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales 	1150
G03F   1/46		ȿɻߥƥ󥰡Σ	Antireflective coatings	466
G03F   1/48		ݸƥ󥰡Σ	Protective coatings	940
G03F   1/50		롼ףǣƣǣƣޤʤޥ֥󥯡νΣ	Mask blanks not covered by groups <b>G03F1/20 to G03F1/26</b> ; Preparation thereof	1436
G03F   1/52		ȿͺΣ	Reflectors	378
G03F   1/54		ۼࡤ㡥ƩʺΣ	Absorbers, e.g. opaque materials	2901
G03F   1/56		ͭŪʵۼࡤ㡥եȥ쥸ȡΣ	Organic absorbers, e.g. photo-resists	585
G03F   1/58		İʾΰۤʤۼء㡥ؤ줿ʣؤεۼΣ	having two or more different absorber layers, e.g. stacked multilayer absorbers	667
G03F   1/60		ġΣ	Substrates	1494
G03F   1/62		ڥꥯϥڥꥯ빽¤Ρ㡥ٻե졼ΡνΣ	Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof	2083
G03F   1/64		Υե졼ħΤΡ㡥ι¤ϺΣ	characterised by the frames, e.g. structure or material thereof	1164
G03F   1/66		ƴä˥ޥޥ֥ϥڥꥯŬ礹ΡνΣ	Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof	1330
G03F   1/68		롼ףǣƣǣƣޤʤץΣ	Preparation processes not covered by groups <b>G03F1/20 to G03F1/50</b> 	6950
G03F   1/70		ޥδŪ쥤ϥǥ꥽եץ׵Ŭ礵뤳ȡ㡥ΤΥޥѥκƽΣ	Adapting basic layout or design of masks to lithographic process requirements, e.g. second iteration correction of mask patterns for imaging	3066
G03F   1/72		ޥ٤νϽΣ	Repair or correction of mask defects	1977
G03F   1/74		γΣãУ¡ϡ㡥«ӡࡤˤΡΣ	by charged particle beam [CPB], e.g. focused ion beam	642
G03F   1/76		ˤޥΥѥΣ	Patterning of masks by imaging	1699
G03F   1/78		γΣãУ¡ϡ㡥ŻˤΡΣ	by charged particle beam [CPB], e.g. electron beam	576
G03F   1/80		å󥰡Σ	Etching	2702
G03F   1/82		Ūʥץ㡥꡼˥󥰡Σ	Auxiliary processes, e.g. cleaning	1740
G03F   1/84		Σ	Inspecting	4075
G03F   1/86		γΣãУ¡ϤˤΡΣ	by charged particle beam [CPB]	362
G03F   1/88		꡼վƺΤ˼̿ץˤäƽ줿ΡΣ	prepared by photographic processes for producing originals simulating relief	495
G03F   1/90		󥿡ץˤäƽ줿ΡΣ	prepared by montage processes	1194
G03F   1/92		ɽ̤줿ΡΣ	prepared from printing surfaces	842
G03F   3/00		ʬ򡨿Ĵνʼ̿Ūʣְ̣ǣ¡	Colour separation; Correction of tonal value(photographic copying apparatus in general <b>G03B</b>)	633
G03F   3/02		깩ˤ	by retouching	101
G03F   3/04		̿Ūʤˤ	by photographic means	286
G03F   3/06		ޥ󥰤ˤ	by masking	210
G03F   3/08		Ūʤˤ	by photoelectric means	3572
G03F   3/10		ʬͥޤϥݥοޤĴҤΥå	Checking the colour or tonal value of separation negatives or positives	2457
G03F   5/00		꡼ˡΤΥ꡼	Screening processes; Screens therefor	1291
G03F   5/02		ˡˤΡʥǣ¡	by projecting methods(cameras <b>G03B</b>)	90
G03F   5/04		ֳݤ̤Ѳˤ	changing the screen effect	53
G03F   5/06		ʤ̤Ѳˤ	changing the diaphragm effect	30
G03F   5/08		ʿ꡼λ	using line screens	21
G03F   5/10		꡼λ	using cross-line screens	64
G03F   5/12		¾Υ꡼㡥ܥ꡼󡤤λ	using other screens, e.g. granulated screen	186
G03F   5/14		̩ˡˤ	by contact methods	188
G03F   5/16		Ĵ꡼λ	using grey half-tone screens	56
G03F   5/18		顼Ĵ꡼λ	using colour half-tone screens	43
G03F   5/20		ӥֳݤλ	using screens for gravure printing	459
G03F   5/22		Υ꡼ȹ礻ˡ⥢ν	combining several screens; Elimination of moire	202
G03F   5/24		¿Ϫ㡥̿ȥ꡼ȹ礻	by multiple exposure, e.g. combined processes for line photo and screen	122
G03F   7/00		եȥᥫ˥ˡ㡥եȥ꥽ˡˤ̲ϥѥ󲽤줿ɽ̡㡥ɽ̡¤Τκ㡥եȥ쥸ȤʤΡΤäŬ礷̤֡¤ˡΤΥեȥ쥸ȹ¤ѤΡطսꡤ㡥£áȣУȣˡ򻲾ȡˡΣ	Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor  (using photoresist structures for special production processes, <u>see</u> the relevant places, e.g. <b>B44C</b>, <b>H10P76/00</b>, <b>H05K</b>)	40552
G03F   7/004		ʣǣƣǣƣͥˡΣ	Photosensitive materials(<b>G03F7/12</b>, <b>G03F7/14</b> take precedence)	49999
G03F   7/008		ɡʣǣƣͥˡΣ	Azides(<b>G03F7/075</b> takes precedence)	843
G03F   7/012		ʬҥɡʬźúޡ㡥ޡΣ	Macromolecular azides; Macromolecular additives, e.g. binders	493
G03F   7/016		˥ϲʪʣǣƣͥˡΣ	Diazonium salts or compounds(<b>G03F7/075</b> takes precedence)	885
G03F   7/021		ʬҥ˥ಽʪʬźúޡ㡥ޡΣ	Macromolecular diazonium compounds; Macromolecular additives, e.g. binders	1034
G03F   7/022		Υ󥸥ɡʣǣƣͥˡΣ	Quinonediazides(<b>G03F7/075</b> takes precedence)	3757
G03F   7/023		ʬҥΥ󥸥ɡʬźúޡ㡥ޡΣ	Macromolecular quinonediazides; Macromolecular additives, e.g. binders	3944
G03F   7/025		úǡúǻŷͭʬҸŹʪ㡥󲽹ʪʣǣƣͥˡΣ	Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds(<b>G03F7/075</b> takes precedence)	261
G03F   7/027		úǡúŷͭʬҸŹʪ㡥󲽹ʪʣǣƣͥˡΣ	Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds(<b>G03F7/075</b> takes precedence)	18259
G03F   7/028		ʪĤΡ㡥Ź糫ϺޡΣ	with photosensitivity-increasing substances, e.g. photoinitiators	7045
G03F   7/029		̵ʪ˥ಽʪǡβʳΰۼ︶ҤͭʪΣ	Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur	4061
G03F   7/031		롼ףǣƣޤʤͭʪΣ	Organic compounds not covered by group <b>G03F7/029</b>	6087
G03F   7/032		ޤĤΡΣ	with binders	4803
G03F   7/033		ޤúǡú˰·ޤȿΤߤˤä줿ŹΤǤΡ㡥ӥ˥ŹΡΣ	the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers	6795
G03F   7/035		ޤݥꥦ쥿ǤΡΣ	the binders being polyurethanes	611
G03F   7/037		ޤݥꥢߥϥݥꥤߥɤǤΡΣ	the binders being polyamides or polyimides	1975
G03F   7/038		ðŪ˿ƿˤʤʬҲʪʣǣƣͥ表ʬҥɣǣƣʬҥ˥ಽʪǣƣˡΣ	Macromolecular compounds which are rendered insoluble or differentially wettable(<b>G03F7/075</b> takes precedence; macromolecular azides <b>G03F7/012</b>; macromolecular diazonium compounds <b>G03F7/021</b>)	18184
G03F   7/039		ʬǽʹʬҲʪ㡥ݥŻҥ쥸ȡʣǣƣͥ表ʬҥΥ󥸥ɣǣƣˡΣ	Macromolecular compounds which are photodegradable, e.g. positive electron resists(<b>G03F7/075</b> takes precedence; macromolecular quinonediazides <b>G03F7/023</b>)	17919
G03F   7/04		ʣǣƣͥˡΣ	Chromates(<b>G03F7/075</b> takes precedence)	714
G03F   7/06		ʣǣƣͥˡΣ	Silver salts(<b>G03F7/075</b> takes precedence)	1243
G03F   7/07		Ȼž̤ѤΡΣ	used for diffusion transfer	1344
G03F   7/075		ꥳͭʪΣ	Silicon-containing compounds	7023
G03F   7/085		¥ʬźúޤħΤ봶ʪʣǣƣͥˡΣ	Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives(<b>G03F7/075</b> takes precedence)	599
G03F   7/09		¤κ㡥ٻΡءħΤΡʰѻٻΰ̣£ΡˡΣ	characterised by structural details, e.g. supports, auxiliary layers(supports for printing plates in general <b>B41N</b>)	7280
G03F   7/095		İʾδؤĤΡʣǣƣͥˡΣ	having more than one photosensitive layer(<b>G03F7/075</b> takes precedence)	2526
G03F   7/105		Ļ뤿ʪ㡥ؼĤΡΣ	having substances, e.g. indicators, for forming visible images	2538
G03F   7/11		ʤء㡥ؤĤΡΣ	having cover layers or intermediate layers, e.g. subbing layers	10259
G03F   7/115		դˤƥ꡼Ϥɤ̩뤿μʤͭٻؤĤΡΣ	having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing	338
G03F   7/12		꡼ΰǡ㡥ƥ󥷥롤¤	Production of screen printing forms or similar printing forms, e.g. stencils	1964
G03F   7/14		װǤ¤	Production of collotype printing forms	189
G03F   7/16		ˡΤ֡ʻٻκؤ۰̣£̿ŪѻٻΤؤδʪۣǣã	Coating processes; Apparatus therefor(applying coatings to base materials in general <b>B05</b>; applying photosensitive compositions to the base for photographic purposes <b>G03C1/74</b>)	14501
G03F   7/18		֤̤ؤ	Coating curved surfaces	294
G03F   7/20		ϪΤ֡ʣѼ֣̿ǣ£ˡΣ	Exposure; Apparatus therefor(photographic printing apparatus for making copies <b>G03B27/00</b>)	95166
G03F   7/207		Ĵʡ㡥ưĴʡʰֹ碌ȾĴȤȹ碌ǣƣƾ֤μưĴʣǣ£Ĵ΅μưȯΤΥƥ̣ǣ£ˡΣ	Means for focusing, e.g. automatically(combination of positioning and focusing <b>G03F9/02</b>; systems for automatic generation of focusing signals in general <b>G02B7/28</b>; means for automatic focusing of projection printing apparatus <b>G03B27/34</b>)	1411
G03F   7/213		Ʊɽ̤ΰۤʤ֤ƱѥƱϪΡʣǣƣͥˡΣ	Exposing with the same light pattern different positions of the same surface at the same time(<b>G03F7/207</b> takes precedence)	143
G03F   7/22		Ʊɽ̤ΰۤʤ֤Ʊѥ༡ϪΡʣǣƣͥˡΣ	Exposing sequentially with the same light pattern different positions of the same surface(<b>G03F7/207</b> takes precedence)	1650
G03F   7/23		ΤμưŪʼʡΣ	Automatic means therefor	184
G03F   7/24		֤ɽ̤ؤϪ	Curved surfaces	1161
G03F   7/26		νΤ֡ʣǣƣǣƣͥˡΣ	Processing photosensitive materials; Apparatus therefor(<b>G03F7/12 to G03F7/24</b>  take precedence)	11699
G03F   7/28		ʴβ뤿ΤΡʣǣƣͥˡΣ	for obtaining powder images(<b>G03F3/10</b> takes precedence)	323
G03F   7/30		μʤѤͽΣ	Imagewise removal using liquid means	11611
G03F   7/32		Ταʪ㡥ޡΣ	Liquid compositions therefor, e.g. developers	7161
G03F   7/34		Ūž̤ˤͽ㡥ΥΣ	Imagewise removal by selective transfer, e.g. peeling away	1341
G03F   7/36		롼ףǣƣǣƣޤʤͽ㡥ήѤΡץ饺ޤѤΡΣ	Imagewise removal not covered by groups <b>G03F7/30 to G03F7/34</b> , e.g. using gas streams, using plasma	1524
G03F   7/38		ͽν㡥ͽǮΣ	Treatment before imagewise removal, e.g. prebaking	6006
G03F   7/40		ͽν㡥ǮΣ	Treatment after imagewise removal, e.g. baking	10919
G03F   7/42		ΥϤΤνޡΣ	Stripping or agents therefor	6488
G03F   9/00		ơޥե졼ࡤ̿ȡɽ̹¤ޤͤ줿ɽ̡ΰַޤϰֹ碌㡥ưŪʤΡʣǣƣͥ表̿ޥ¤ǣƣʣѼ̿ѤΤΣǣ£ˡΣ	Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically(<b>G03F7/22</b> takes precedence; preparation of photographic masks <b>G03F1/00</b>; within photographic printing apparatus for making copies <b>G03B27/00</b>)	18346
G03F   9/02		ưĴμʤȹ碌ΡʼưĴ̣ǣ£Ĵ΅μưȯΤΥƥǣ£ˡΣ	combined with means for automatic focusing(automatic focusing in general <b>G02B7/09</b>; systems for automatic generation of focusing signals <b>G02B7/28</b>)	778
