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Home> Announcements> International topics> The Industrial Design 5 Forum (ID5)> 11th ID5 Annual Meeting Concludes Successfully

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11th ID5 Annual Meeting Concludes Successfully

October 30, 2025

The 11th Annual Meeting of the Industrial Design 5 (ID5), which includes Japan, the United States, Europe, China and Korea, was held in Alexandria, Virginia, in the United States on October 23, 2025. Mr. KITAMURA Hiroki, Director-General of the Patent and Design Examination Department, attended the meeting from the Japan Patent Office (JPO).

During the meeting, discussions were held to review the progress and future direction of the ten cooperative projects presently underway. In addition, it was agreed to newly launch two cooperative projects related to international design applications under the Hague System. Finally, it was decided that the China National Intellectual Property Administration (CNIPA) will host the 2026 Meetings.

The ID5 User Session was held the following day, October 24th, for user representatives from industry groups and agent organizations in each country and region. This year’s host office, the United States Patent and Trademark Office (USPTO), began by presenting an overview of the ID5 Annual Meeting outcomes, and the ID5 offices and WIPO subsequently reported on the latest developments. User representatives then delivered presentations on the theme “The Future of ID5,” which were followed by an exchange of views among offices and users.

An international roundtable titled “Artificial Intelligence and Industrial Designs” was additionally held on the day prior to the Annual Meeting, October 22nd. There, representatives from the offices of Japan, the United States, and Europe, along with experts from the United States, gave presentations and engaged in discussions on issues such as the authorship of designs created using generative AI.

Looking forward, the JPO will continue to advance ID5 initiatives in order to create an environment wherein Japan’s top designs can be more appropriately protected and utilized worldwide.

(Photo) Representatives from the ID5 Offices and WIPO (Mr. Kitamura appears second from left)
Representatives from the ID5 Offices and WIPO
(Mr. Kitamura appears second from left)

(Photo) Speakers at the international roundtable “Artificial Intelligence and Industrial Designs”(Mr. Kitamura appears third from right)
Speakers at the international roundtable “Artificial Intelligence and Industrial Designs”
(Mr. Kitamura appears third from right)

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[Last updated 9 June 2026]

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